11:27 AM EST - HPQ Silicon Inc. : Updates shareholders on a recent patent filing related to its “Silicon-based anode material initiative.” HPQ filed a new provisional patent application in France related to a continuous Silicon Oxide (SiOx) manufacturing process based on a modified PUREVAPTM QRR design. As per French law, HPQ acquired all rights held by the inventors for C$90,000.00. The patent protects a unique QRR technology configuration that allows the production of SiOx on the same equipment. HPQ Silicon Inc.
shares V.HPQ are trading down $0.01 at $0.24.
